- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/24 - Reflection masks; Preparation thereof
Patent holdings for IPC class G03F 1/24
Total number of patents in this class: 973
10-year publication summary
|
70
|
72
|
63
|
51
|
74
|
89
|
116
|
132
|
119
|
47
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
202 |
| Hoya Corporation | 2822 |
178 |
| Agc, Inc. | 4029 |
94 |
| Applied Materials, Inc. | 16587 |
75 |
| Samsung Electronics Co., Ltd. | 131630 |
55 |
| ASML Netherlands B.V. | 6816 |
54 |
| Carl Zeiss SMT GmbH | 2646 |
41 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
29 |
| Toppan Photomask Co., Ltd. | 56 |
29 |
| Kioxia Corporation | 9847 |
22 |
| Toppan Printing Co., Ltd. | 2212 |
17 |
| Asahi Glass Company, Limited | 2985 |
13 |
| GLOBALFOUNDRIES U.S. Inc. | 6459 |
11 |
| SK Hynix Inc. | 11030 |
10 |
| S&S Tech Co., Ltd. | 26 |
10 |
| Mitsui Chemicals, Inc. | 3134 |
9 |
| KLA Corporation | 1223 |
9 |
| International Business Machines Corporation | 60644 |
6 |
| Toppan Inc. | 746 |
6 |
| KLA-Tencor Corporation | 2574 |
5 |
| Other owners | 98 |